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  4. Structural investigations of epitaxial InN by x-ray photoelectron diffraction and x-ray diffraction
 
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Structural investigations of epitaxial InN by x-ray photoelectron diffraction and x-ray diffraction

Auteur(s)
Hofstetter, Daniel 
Institut de physique 
Despont, Laurent
Garnier, Michael Bernard Gunnar
Baumann, Esther
Giorgetta, Fabrizio R.
Aebi, Philipp
Kirste, Lutz
Lu, Hai
Schaff, William J.
Date de parution
2007
In
Applied Physics Letters, American Institute of Physics (AIP), 2007/90/191912/1-3
Résumé
The authors investigated a 1 <i>µ</i>m thick molecular beam epitaxy–grown InN film by means of full hemispherical x-ray photoelectron diffraction and high resolution x-ray diffraction. While x-ray diffraction reveals that this nominally hexagonal InN layer contains roughly 1% of cubic phase InN, a comparison between measured and simulated x-ray photoelectron diffraction data allowed them to directly determine the polarity of the crystal. Furthermore, the data indicate that the InN surface consists of a mosaic of domains oriented at an azimuth of 180° to each other, where the azimuth corresponds to the rotation angle around the [0001] axis.
Identifiants
https://libra.unine.ch/handle/123456789/17065
_
10.1063/1.2738372
Type de publication
journal article
Dossier(s) à télécharger
 main article: Hofstetter_Daniel_-_Structural_investigations_of_epitaxial_InN_20080312.pdf (449.5 KB)
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