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  4. Lattice-Matched GaN–InAlN Waveguides at λ = 1.55 μm Grown by Metal–Organic Vapor Phase Epitaxy

Lattice-Matched GaN–InAlN Waveguides at λ = 1.55 <i>μ</i>m Grown by Metal–Organic Vapor Phase Epitaxy

Author(s)
Lupu, A.
Julien, François H.
Golka, Sebastian
Pozzovivo, G.
Strasser, Gottfried
Baumann, Esther
Giorgetta, Fabrizio R.
Hofstetter, Daniel  
Laboratoire temps-fréquence  
Nicolay, S.
Mosca, M.
Feltin, E.
Carlin, J.-F.
Grandjean, N.
Date issued
2008
In
Photonics Technology Letters (IEEE), Institute of Electrical and Electronics Engineers (IEEE), 2008/20/2/102-104
Subjects
GaN intersubband (ISB) devices optica lcommunication optical waveguide (WG)
Abstract
We report on the demonstration of low-loss, single-mode GaN-InAlN ridge waveguides (WGs) at fiber-optics telecommunication wavelengths. The structure grown by metal-organic vapor phase epitaxy contains AlInN cladding layers lattice-matched to GaN. For slab-like WGs propagation losses are below 3 dB/mm and independent of light polarization. For 2.6-<i>μ</i>m-wide WGs the propagation losses in the 1.5- to 1.58-<i>μ</i>m spectral region are as low as 1.8 and 4.9 dB/mm for transverse-electric- and transverse-magnetic-polarization, respectively. The losses are attributed to the sidewall roughness and can be further reduced by the optimization of the etching process.
Publication type
journal article
Identifiers
https://libra.unine.ch/handle/20.500.14713/58871
DOI
10.1109/LPT.2007.912551
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