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Herzig, Hans-Peter
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Herzig, Hans-Peter
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- PublicationAccès libreMicrolens lithography: A new approach for large display fabrication(1996)
; ; Hugle, William B.Microlens lithography is a new lithographic method, that uses microlens arrays to image a lithographic mask onto a substrate layer. Microlens lithography provides photolithography at a moderate resolution for an almost unlimited area. The imaging system consists of stacked microlens arrays forming an array of micro-objectives. Each micro-objective images a small part of the mask pattern, the images overlap in the image plane. Potential applications for microlens lithography are the fabrication of large area flat panel displays (FPD), color filters, and micromechanics. - PublicationAccès libreMicrolens array imaging system for photolithography(1996)
; ; Hugle, William B.A micro-optical system is proposed that uses a stack of four microlens arrays for 1:1 imaging of extended object planes. The system is based on the concept of multiple-aperture imaging. A compact system is presented that is remarkable in that it provides a diffraction-limited resolution of 3 µm for unlimited object and image areas. Resolution of 5 µm has been demonstrated for an area of 20 × 20 mm2 in an experimental setup using melting resist microlens arrays (190-µm lens diameter). The investigated imaging system was developed in connection with a new contactless photolithographic technique called microlens lithography. This new lithographic imaging technique provides an increased depth of focus (>50 µm) at a larger working distance (>1 mm) than with customary proximity printing. Potential applications are photolithography for large print areas (flat panel displays, color filters), for thick photoresist layers (micromechanics), on curved surfaces (or substrates with poor planarity), in V grooves, etc.