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Microlens lithography: A new approach for large display fabrication
Auteur(s)
Völkel, Reinhard
Nussbaum, Philippe
Singer, Wolfgang
Hugle, William B.
Date de parution
1996
In
Microelectronic Engineering, Elsevier, 1996/30/1-4/107-110
Résumé
Microlens lithography is a new lithographic method, that uses microlens arrays to image a lithographic mask onto a substrate layer. Microlens lithography provides photolithography at a moderate resolution for an almost unlimited area. The imaging system consists of stacked microlens arrays forming an array of micro-objectives. Each micro-objective images a small part of the mask pattern, the images overlap in the image plane. Potential applications for microlens lithography are the fabrication of large area flat panel displays (FPD), color filters, and micromechanics.
Identifiants
Type de publication
journal article
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