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Microlens array imaging system for photolithography
Auteur(s)
Völkel, Reinhard
Nussbaum, Philippe
Hugle, William B.
Date de parution
1996
In
Optical Engineering, International Society for Optical Engineering (SPIE), 1999/35/1/3323-3330
Résumé
A micro-optical system is proposed that uses a stack of four microlens arrays for 1:1 imaging of extended object planes. The system is based on the concept of multiple-aperture imaging. A compact system is presented that is remarkable in that it provides a diffraction-limited resolution of 3 µm for unlimited object and image areas. Resolution of 5 µm has been demonstrated for an area of 20 × 20 mm<sub>2</sub> in an experimental setup using melting resist microlens arrays (190-µm lens diameter). The investigated imaging system was developed in connection with a new contactless photolithographic technique called <i>microlens lithography</i>. This new lithographic imaging technique provides an increased depth of focus (>50 µm) at a larger working distance (>1 mm) than with customary proximity printing. Potential applications are photolithography for large print areas (flat panel displays, color filters), for thick photoresist layers (micromechanics), on curved surfaces (or substrates with poor planarity), in V grooves, etc.
Identifiants
Type de publication
journal article
