Photopatterning at thick photoresist layers for MEMS applications

Author(s)

Roth, Sylvain

Editor(s)

Publisher

Neuchâtel : Université de Neuchâtel

Date issued

2000

Number of pages

120 p.

Subjects

Photoresist MIKROELEKTROMECHANISCHE BAUELEMENTE, MEMS (ELEKTROTECHNIK) PHOTOLITHOGRAPHIE (PHOTOGRAPHIE) Hochschulschrift

Notes

Thèse de doctorat, Sciences, Microtechnique

Publication type

doctoral thesis

Identifiers

DOI

File(s)

Name

00001526.pdf

Type

Main Article

Size

1.68 MB

Format

Adobe PDF