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Potential of VHF-plasmas for low-cost production of a-Si: H solar cells
Auteur(s)
Kroll, U.
Shah, Arvind
Keppner, Herbert
Meier, Johannes
Torres, Pedro
Fischer, D.
Date de parution
1997
In
Solar Energy Materials and Solar Cells, Elsevier, 1997/48/1-4/343-350
Résumé
Compared to the use of the standard glow discharge technique the production of amorphous silicon solar cells by the very high frequency glow discharge (VHF-GD) bears yet additional cost reduction potentials: <br> Using VHF-GD at excitation frequencies higher than 13.56 MHz, a more efficient dissociation of silane gas is obtained; thus, higher deposition rates are achieved; this reduces considerably the deposition time for intrinsic amorphous and microcrystalline silicon layers. <br> Furthermore, by itself and even more so, in combination with argon dilution, VHF-GD technique improves silane utilisation and leads, thus, to further cost reduction. <br> Finally, by combining the VHF-GD technique and the “micromorph” concept “real” tandem cells (i.e. a superposition of two cells with distinctly different band gaps) can be deposited at low temperatures without the use of expensive germane gas.
Identifiants
Type de publication
journal article
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