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Diffractive structures for testing nano-meter technology
Auteur(s)
Blattner, Peter
Naqvi, S. S. H.
Herzig, Hans-Peter
Ehbets, Peter
Date de parution
1995
In
Microelectronic Engineering, Elsevier, 1995/27/1-4/543-546
Résumé
We investigated two optical methods for characterizing submicron structures. Average errors of a few nanometers can be determined by the far-field diffraction metrology utilizing diffractive structures having enhanced sensitivity to fabrication errors. The scanning spot metrology is well suited for analyzing lithographic masks.
Identifiants
Type de publication
journal article
