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High-carrier-frequency fan-out gratings fabricated by total internal reflection holographic lithography
Auteur(s)
Ehbets, Peter
Herzig, Hans-Peter
Kuittinen, Markku
Clube, Francis S. M.
Darbellay, Yves
Date de parution
1995
In
Optical Engineering, International Society for Optical Engineering (SPIE), 1995/34/8/2377-2383
Résumé
Total internal reflection (TIP) holographic lithography is applied to the fabrication of binary diffractive optical elements with submicrometer surface relief features. The recording conditions for the intermediate TIR volume hologram, used for high-resolution proximity printing, are discussed. In particular, the fabrication of efficient high-carrier-frequency fan-out gratings is considered and experimental results are presented for an off-axis 9x1 fan-out element in photoresist with a carrier frequency of 1000 lines/mm.
Identifiants
Type de publication
journal article
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