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Scope of VHF plasma deposition for thin-film silicon solar cells
Auteur(s)
Keppner, Herbert
Kroll, U.
Torres, Pedro
Meier, Johannes
Fischer, Diego
Goetz, M.
Tscharner, R.
Shah, Arvind
Date de parution
1996
In
Conference Record of the 25th IEEE Photovoltaic Specialists Conference, Institute of Electrical and Electronics Engineers (IEEE), 1996///669-672
Résumé
The world-wide attempts in obtaining thin-film crystalline silicon are reviewed. Based on literature published so far, it appears that high-temperature manufacturing steps seem to be unavoidable for obtaining high conversion efficiencies of crystalline silicon based solar cells. High process temperatures are in contradiction for the use of low-cost substrates like e.g. glass or aluminium. Such substrates, however, are essential for obtaining low module manufacturing costs. The very high frequency glow discharge process (VHF-GD) could have the potential to overcome the temperature-efficiency contradiction.
Identifiants
Type de publication
journal article
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