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Fast deposition of μc-Si:H by restrictive dilution and enhanced HF-power
Auteur(s)
Torres, P.
Keppner, H.
Meier, Johannes
Kroll, U.
Beck, N.
Shah, A.
Date de parution
1997
In
Physica status solidi. A. Applied research, Wiley, 1997/163/2/R9-R10
Résumé
The purpose of this paper is to demonstrate that an enhanced deposition rate in excess of 10Å/s with reasonnable cell performances is however, indeed possible while remaining within the Very High Frequency-Glow Discharge (VHF-GD) deposition technique (at plasma excitation frequencies of 70 to 130MHz).
Identifiants
Type de publication
journal article
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