X-ray photoelectron diffraction of (100)-oriented chemical vapor deposited diamond films on silicon (100)

(100)-oriented diamond films have been grown on silicon (100) in a microwave plasma assisted chemical vapor deposition (CVD) tubular system. X-ray photoelectron diffraction (XPD) has been used to study such oriented polycrystalline films. Comparing the diffractograms of a natural diamond (100) surface and of polycrystalline (100)-oriented CVD diamond films quite similar features are observed. XPD measurements after 8 min of bias treatment show that the tiny crystals are already preferentially oriented at deposition parameters required for (100)-oriented film growth. Our measurements indicate a strong need to control the growth parameters very carefully during the first minutes of growth to get an orientation.