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  4. Disordering of InGaN/GaN Superlattices After High-Pressure Annealing

Disordering of InGaN/GaN Superlattices After High-Pressure Annealing

Author(s)
McCluskey, Matthew D.
Romano, Linda T.
Krusor, B. S.
Hofstetter, Daniel  
Laboratoire temps-fréquence  
Bour, David P.
Kneissl, Michael
Johnson, N. M.
Suski, T.
Jun, J.
Date issued
1999
In
MRS Internet Journal of Nitride Semiconductor Research, Materials Research Society (MRS), 1999/4S1/G3.42/1-6
Abstract
Interdiffusion of In and Ga is observed in InGaN multiple-quantum-well superlattices for annealing temperatures of 1250 to 1400°C. Hydrostatic pressures of up to 15 kbar were applied during the annealing treatments to prevent decomposition of the InGaN and GaN. In as-grown material, x-ray diffraction spectra show InGaN superlattice peaks up to the fourth order. After annealing at 1400°C for 15 min, only the zero-order InGaN peak is observed, a result of compositional disordering of the superlattice. Composition profiles from secondary ion mass spectrometry indicate significant diffusion of Mg from the <i>p</i>-type GaN layer into the quantum well region. This Mg diffusion may lead to an enhancement of superlattice disordering. For annealing temperatures between 1250 and 1300°C, a blue shift of the InGaN spontaneous emission peak is observed, consistent with interdiffusion of In and Ga in the quantum-well region.
Publication type
journal article
Identifiers
https://libra.unine.ch/handle/20.500.14713/58599
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McCluskey_M._D._-_Disordering_of_InGaN_GaN_superlattices_20080520.pdf

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