Repository logo
Research Data
Publications
Projects
Persons
Organizations
English
Français
Log In(current)
  1. Home
  2. Publications
  3. Article de recherche (journal article)
  4. In situ silicon oxide based intermediate reflector for thin-film silicon micromorph solar cells

<i>In situ</i> silicon oxide based intermediate reflector for thin-film silicon micromorph solar cells

Author(s)
Buehlmann, Peter
Bailat, J.
Dominé, Didier
Billet, Adrian
Meillaud, F.
Feltrin, Andrea
Ballif, Christophe
Date issued
2007
In
Applied Physics Letters, American Institute of Physics (AIP), 2007/91/143505/1-3
Abstract
We show that SiO-based intermediate reflectors (SOIRs) can be fabricated in the same reactor and with the same process gases as used for thin-film silicon solar cells. By varying input gas ratios, SOIR layers with a wide range of optical and electrical properties are obtained. The influence of the SOIR thickness in the micromorph cell is studied and current gain and losses are discussed. Initial micromorph cell efficiency of 12.2% (<i>V</i><sub>oc</sub>=1.40 V, fill factor=71.9%, and <i>J</i><sub>sc</sub>=12.1 mA/cm<sup>2</sup>) is achieved with top cell, SOIR, and bottom cell thicknesses of 270, 95, and 1800 nm, respectively.
Publication type
journal article
Identifiers
https://libra.unine.ch/handle/20.500.14713/58356
DOI
10.1063/1.2794423
File(s)
Loading...
Thumbnail Image
Download
Name

Buehlmann_P._-_In_situ_silicon_oxide_based_intermadiate_20080617.pdf

Type

Main Article

Size

506.76 KB

Format

Adobe PDF

Université de Neuchâtel logo

Service information scientifique & bibliothèques

Rue Emile-Argand 11

2000 Neuchâtel

contact.libra@unine.ch

Service informatique et télématique

Rue Emile-Argand 11

Bâtiment B, rez-de-chaussée

Powered by DSpace-CRIS

libra v2.1.0

© 2025 Université de Neuchâtel

Portal overviewUser guideOpen Access strategyOpen Access directive Research at UniNE Open Access ORCIDWhat's new