Microfabrication of Pt-tip microelectrodes
Author(s)
Thiébaud, P.
Beuret, C.
de Rooij, Nicolaas F.
Koudelka-Hep, Milena
Date issued
2000
In
Sensors and Actuators B : Chemical, Elsevier, 2000/70/1-3/51-56
Subjects
Pt-tip microelectrodes Microfabrication technology Si anisotropic etching
Abstract
This paper describes the realization of Pt-tip microelectrodes by using microfabrication technology. The total height of these microelectrodes is 47 μm, of which the upper 20 or 2 μm, respectively, are exposed Pt tips with a curvature of 0.5 μm. In order to verify the tip opening, an electrochemical plating of thin-film Pt was used. This improves the visualisation of the tips in an SEM and allows us to ascertain the absence of any residual layer. The manufacturing process was assessed by SEM imaging and, in the case of large Pt-tip electrodes, also by an electrochemical evaluation.
Publication type
journal article
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