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  4. Microlens lithography: A new approach for large display fabrication

Microlens lithography: A new approach for large display fabrication

Author(s)
Völkel, Reinhard
Herzig, Hans-Peter  
Labo d'optique appliquée  
Nussbaum, Philippe
Singer, Wolfgang
Dändliker, René  
Labo d'optique appliquée  
Hugle, William B.
Date issued
1996
In
Microelectronic Engineering, Elsevier, 1996/30/1-4/107-110
Abstract
Microlens lithography is a new lithographic method, that uses microlens arrays to image a lithographic mask onto a substrate layer. Microlens lithography provides photolithography at a moderate resolution for an almost unlimited area. The imaging system consists of stacked microlens arrays forming an array of micro-objectives. Each micro-objective images a small part of the mask pattern, the images overlap in the image plane. Potential applications for microlens lithography are the fabrication of large area flat panel displays (FPD), color filters, and micromechanics.
Publication type
journal article
Identifiers
https://libra.unine.ch/handle/20.500.14713/64614
DOI
10.1016/0167-9317(95)00205-7
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V_lker_Reinhard_-_Microlens_Lithography_A_new_approach_20071219.pdf

Type

Main Article

Size

1.18 MB

Format

Adobe PDF

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