Low pressure chemical vapor deposited Zinc Oxide for thin film silicon solar cells: optical and electrical properties
Author(s)
Steinhauser, Jérôme
Editor(s)
Ballif, Christophe
Date issued
2008
Subjects
Zinc oxide low pressure chemical vapor deposition transparent conductive oxide thin film silicon solar cells.
Abstract
Transparent conductive oxides (TCO), such as LPCVD ZnO:B (low pressure chemical vapor deposited zinc oxide doped with boron), play a major role as contacts in thin film silicon photovoltaic solar cells. This document study the "LPCVD ZnO:B layers, from the deposition process to the final application" and focus especially on their electrical and optical properties. This work intended on understanding the physics of the LPCVD ZnO:B film properties in order to efficiently optimize its characteristics to obtain TCO films well suited for thin film solar cell applications. In particular, theoretical models that describe the optical and electrical properties of LPCVD ZnO:B films are determined and verified experimentally.
Notes
Thèse de doctorat : Université de Neuchâtel, 2008 ; Th. 2099
Publication type
doctoral thesis
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