Nanofabrication of protein-patterned substrates for future cell adhesion experiments
Author(s)
Künzi, P.A.
Lussi, J.
Aeschimann, Laure
Danuser, G.
Textor, M.
de Rooij, Nicolaas F.
Staufer, Urs
Date issued
2005
In
Microelectronic Engineering, Elsevier, 2005/78-79//582-586
Subjects
Electron beam lithography Nanofabrication Protein patterning Self-assembling Protein adsorption Indium-tin-oxide
Abstract
A method for fabricating sub-micrometer size adhesion sites for future experiments in cell biology is presented. Glass substrates were coated with a thin layer of InSnO and SiO<sub>2</sub>. The SiO<sub>2</sub> was structured by means of electron beam lithography and reactive ion etching, exposing sub-micrometer patches of the underlying InSnO. Dodecylphosphate, to which proteins can bind, was selectively adsorbed on these InSnO structures, whereas poly-l-lysine-<i>g</i>-poly(ethylene glycol) was used to passivate the surrounding SiO<sub>2</sub> against protein adsorption. The effectiveness of the process was investigated by fluorescent microscopy and scanning near-field optical microscopy on substrates which have been exposed to fluorescently labeled streptavidin.
Publication type
journal article
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