Diffractive structures for testing nano-meter technology

Blattner, Peter; Naqvi, S. S. H.; Herzig, Hans-Peter; Ehbets, Peter

doi:10.1016/0167-9317(94)00163-O

Diffractive structures for testing nano-meter technology

Author(s)

Blattner, Peter

Naqvi, S. S. H.

Herzig, Hans-Peter

Ehbets, Peter

Date issued

1995

In

Microelectronic Engineering, Elsevier, 1995/27/1-4/543-546

Abstract

We investigated two optical methods for characterizing submicron structures. Average errors of a few nanometers can be determined by the far-field diffraction metrology utilizing diffractive structures having enhanced sensitivity to fabrication errors. The scanning spot metrology is well suited for analyzing lithographic masks.