Scope of VHF plasma deposition for thin-film silicon solar cells

The world-wide attempts in obtaining thin-film crystalline silicon are reviewed. Based on literature published so far, it appears that high-temperature manufacturing steps seem to be unavoidable for obtaining high conversion efficiencies of crystalline silicon based solar cells. High process temperatures are in contradiction for the use of low-cost substrates like e.g. glass or aluminium. Such substrates, however, are essential for obtaining low module manufacturing costs. The very high frequency glow discharge process (VHF-GD) could have the potential to overcome the temperature-efficiency contradiction.