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  4. High-rate deposition of hydrogenated amorphous silicon by the VHF-GD method

High-rate deposition of hydrogenated amorphous silicon by the VHF-GD method

Author(s)
Curtins, H.
Favre, M.
Wyrsch, Nicolas
Brechet M.
Prasad K.
Shah, Arvind
Date issued
1987
In
Proceedings of the 19th IEEE Photovoltaic Specialists Conference, Institute of Electrical and Electronics Engineers (IEEE), 1987///695-698
Publication type
journal article
Identifiers
https://libra.unine.ch/handle/20.500.14713/61180
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Curtins_H._-_High-rate_depositions_of_hydrogenated_20080918.pdf

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